1. Dustry plasmas : physics, chemistry and technological impacts in plasma processing
پدیدآورنده : edited by Andre Bouchoule
کتابخانه: Central Library of Amirkabir University of Technology (Tehran)
موضوع : Plasma engineering , Plasma )Ionized gases( , Dusty Plasmas , Plasma chemistry , Plasma-enhanced chemical vapor deposition
رده :
TA
2020
.
D88
1999
2. Dusty plasma: Physics, chemistry and technological impacts in plasma processing
پدیدآورنده : / edited by Andre Bouchoule
کتابخانه: Central Library, Center of Documentation and Supply of Scientific Resources (East Azarbaijan)
موضوع : Plasma engineering,Plasma (Ionized gases)- Industrial applications,Dust,Plasma chemistry,Plasma enhanced chemical vapor deposition
رده :
TA2020
.
D88
1999
3. Dusty plasmas : physics, chemistry, and technological impacts in plasma processing
پدیدآورنده : edited by Andre Bouchoule
موضوع : ، Plasma engineering,Industrial applications ، Plasma )Ionized gases(,، Dusty plasmas,، Plasma chemistry,، Plasma-enhanced chemical vapor deposition
۲ نسخه از این کتاب در ۲ کتابخانه موجود است.
4. Dusty plasmas : physics, chemistry, and technological impacts in plasma processing
پدیدآورنده : edited by Andre Bouchoule
کتابخانه: Library of Institute for Research in Fundamental Sciences (Tehran)
موضوع : ، Plasma engineering,Industrial applications( ، Plasma )Ionized gases(,، Dusty plasmas,، Plasma chemistry,، Plasma-enhanced chemical vapor deposition
رده :
TA
2020
.
D8
5. The application of plasmas to chemical.processing
پدیدآورنده : BADDOUR,RAYMOND F ED
کتابخانه: Central Library of Amirkabir University of Technology (Tehran)
موضوع : PLASMA )IONIZED GASES( , CHEMICAL ENGINEERING
رده :
TP
156
.
P5
A7
